Ginplate Ni Uniramous 225 CLF

It is a Cadmium-Lead free, RoHS Low phosphorous [P-content 2 – 5%] ENP process. Uniramous 225 CLF can be operated at lower range of temperature (55 to 65 °C) and near neutral pH. This product is specifically designed for the electronics industry.

Characteristics

• One Additive for both Make-up and Maintenance
• Phosphorous Content: 3 – 8% by Weight
• Hardness as plated: >550 HV, depending on P%
• The process can be switched from LP ↔ MP by just switching the operating parameters, pH and Temperature
• Ductile coating with zero to slightly compressive Internal Stress
• Magnetic Properties: slightly Magnetic
• Wide window of operating pH (4.5 – 7.0) and temperature (55 – 88 °C)
• Deposition Rate: 7 – 25 µm/hr.
• Good bath life 10 – 12 MTO
• Matte to semi bright finish

Growel Advantage:

• The Uniramous allow platers to use the same product for both make-up and maintenance.
• An enormous amount of time, labour, energy, lab testing work can be saved due to the ease of using a single solution
• The same single process from the same bath can be utilized to plate LP ↔ MP EN plating by just switching the pH and Temperature and vice versa
• Free from Hazardous materials like Lead, Cadmium and other heavy metals
• Good Lubricity, wear and abrasion protection
• The process can be operated at a lower temperature (55 °C) and near neutral pH (7), which makes it suitable for difficult-to-plate material also.

Applications

• Aerospace and Automobile industries
• Engraving and printing rollers
• Food-processing and Medical diagnostic equipment
• Injection molds and Hydraulic cylinders